Updated: 04/26/2017 by Computer Hope

FinFET Device SchematicFinFET, also known as Fin Field Effect Transistor, is a type of non-planar or "3D" transistor used in the design of modern processors. As in earlier, planar designs, it is built on an SOI (silicon on insulator) substrate. However, FinFET designs also use a conducting channel that rises above the level of the insulator, creating a thin silicon structure, shaped like a fin, which is called a gate electrode. This fin-shaped electrode allows multiple gates to operate on a single transistor.

This type of multi-gate process extends Moore's law, allowing semiconductor manufacturers to create CPUs and memory modules that are smaller, perform faster, and consume less energy. Intel began releasing FinFET CPU technology in 2012 with its 22-nm Ivy Bridge processors.

CPU terms, Design, Gate, Insulator, Ivy bridge, Nanometer, Silicon